PG-EAM - Graduate Program in Aeronautical and Mechanical Engineering
PT EN
Article 2013

Magnetic characteristics of nanocrystalline GaMnN films deposited by reactive sputtering

Authors

Pereira, A. L.J.
Iwamoto, W. A.
Pagliuso, P. G.
Lisboa-Filho, P. N.
Da Silva, J. H.D.

Solid State Sciences , vol. 17 , pp. 97-101

ISSN: 12932558

2
Citations
6
Authors

Abstract

The magnetic characteristics of Ga1-xMnxN nanocrystalline films (x = 0.08 and x = 0.18), grown by reactive sputtering onto amorphous silica substrates (a-SiO2), are shown. Further than the dominant paramagnetic-like behaviour, both field- and temperature-dependent magnetization curves presented some particular features indicating the presence of secondary magnetic phases. A simple and qualitative analysis based on the Brillouin function assisted the interpretation of these secondary magnetic contributions, which were tentatively attributed to antiferromagnetic and ferromagnetic phases. © 2012 Elsevier Masson SAS. All rights reserved.

Keywords

Diluted magnetic semiconductor GaMnN Magnetic properties Nanocrystalline material Sputtering

Chemistry (all) (CHEM) Materials Science (all) (MATE) Condensed Matter Physics (PHYS)
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Last Update: 2026-06-25
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PII: S1293255812003846