Article
2015
Use of Cr interlayer to promote the adhesion of SiC films deposited on Ti-6Al-4V by HiPIMS
Authors
Merij, Abrão Chiaranda
Sugahara, Tarcila
Martins, Gislene Valdete
Reis, Danieli Aparecida Pereira
Gonçalves, Polyana Alves Radi
Massi, Marcos
Materials Research , vol. 18 , no. 5 , pp. 904-907
ISSN: 15161439
8
Citations
7
Authors
Abstract
© 2015.In this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness.
Keywords
Adhesion
Cr interlayer
HiPIMS
SiC thin film
Materials Science (all)
(MATE)
Condensed Matter Physics
(PHYS)
Mechanics of Materials
(ENGI)
Mechanical Engineering
(ENGI)
: Scopus
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