Simulation model and exposure phenomena of coherent absorption in HRP lithography.
Autores
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Resumo
Summary form only given, as follows. The mechanisms responsible for latent image formation in lithographic high-resolution plates of Ag salts were studied using laboratory experiments with coherent laser absorption. An exposure model for optical density evalution was derived for feature-dependent analysis. The results of statistical Gaussian spot sensibilization show a quadratic dependence with impinging intensity before the initiation of the saturation process. To extend the analysis to the dynamic scanning condition 2-D modeling was made in an attempt to compare it with the printing of micrometer-line gratings. The general solution is a kinetic expression which shows an erfc dependence in the direction of the movement. The conditions for edge sharpening and feature dependence were identified. By appropriate selection of the band gap of the salts and the laser wavelength, the occurrence of n-photon absorption can be predicted, and unresolved lines can be printed without the common halo of linear laser lithography.
2-s2.0-0024137743
