PG-EAM - Programa de Pós-Graduação em Engenharia Aeronáutica e Mecânica
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Artigo 2013

Magnetic characteristics of nanocrystalline GaMnN films deposited by reactive sputtering

Autores

Pereira, A. L.J.
Iwamoto, W. A.
Pagliuso, P. G.
Lisboa-Filho, P. N.
Da Silva, J. H.D.

Solid State Sciences , vol. 17 , pp. 97-101

ISSN: 12932558

2
Citações
6
Autores

Resumo

The magnetic characteristics of Ga1-xMnxN nanocrystalline films (x = 0.08 and x = 0.18), grown by reactive sputtering onto amorphous silica substrates (a-SiO2), are shown. Further than the dominant paramagnetic-like behaviour, both field- and temperature-dependent magnetization curves presented some particular features indicating the presence of secondary magnetic phases. A simple and qualitative analysis based on the Brillouin function assisted the interpretation of these secondary magnetic contributions, which were tentatively attributed to antiferromagnetic and ferromagnetic phases. © 2012 Elsevier Masson SAS. All rights reserved.

Palavras-chave

Diluted magnetic semiconductor GaMnN Magnetic properties Nanocrystalline material Sputtering

Chemistry (all) (CHEM) Materials Science (all) (MATE) Condensed Matter Physics (PHYS)
: Scopus
Última atualização: 2026-06-25
: 2-s2.0-84872765751
PII: S1293255812003846